专利名称：HAZARDOUS WASTE TREATMENT PROCESS发明人：DEEGAN, David,CHAPMAN, Chris,ISMAIL,
Saeed
申请号：EP07732096.8申请日：20070320公开号：EP2004557A1公开日：20081224
摘要：A method for treating hazardous waste comprising: providing a plasma reactor,waste to be treated and a glass-forming host slag material; contacting within the plasmareactor the waste and the host slag material; and treating the waste and the host slagmaterial using a plasma treatment to melt the host slag material and incorporateinorganic components of the waste within the host slag material, wherein the plasma isgenerated using an arc and the arc is passed through the host slag material.
申请人：Tetronics Limited
地址：A2 Marston Gate, Stirling Road South Marston Park Swindon, Wiltshire SN3 4DEGB
国籍：GB
代理机构：Setna, Rohan P.
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