CVD conformal vacuumpumping guiding design

专利名称：CVD conformal vacuum/pumping guiding

design

发明人：You-Hua Chou,Chih-Tsung Lee,Chia-Ho

Chen,Chin-Hsiang Lin

申请号：US1335申请日：20120120公开号：US09234278B2公开日：20160112

专利附图：

摘要：The present disclosure relates to a guiding element for guiding gas flow withina chamber. The guiding element includes a structure, one or more inlets, an outlet, and a

transportation region. The one or more inlets are formed on a first side of the structure.The inlets have inlet sizes selected according to a removal rate and to mitigate gas flowvariations within the chamber. The outlet is on a second side of the structure, oppositethe first side of the structure. The outlet has an outlet size selected according to theremoval rate. The transportation region is within the structure and couples or connectsthe inlets to the outlet.

申请人：You-Hua Chou,Chih-Tsung Lee,Chia-Ho Chen,Chin-Hsiang Lin

地址：Taipei TW,Hsinchu TW,Zhubei TW,Hsinchu TW

国籍：TW,TW,TW,TW

代理机构：Eschweiler & Associates, LLC

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