OVERLAY MEASURING METHOD

专利名称：OVERLAY MEASURING METHOD发明人：Yosuke OKAMOTO,Taketo KURIYAMA申请号：US13566248申请日：20120803

公开号：US20130148120A1公开日：20130613

专利附图：

摘要：According to one embodiment, an overlay measuring method includes

calculating a first symmetry center coordinate on a basis of reflected light from first andsecond overlay measurement marks formed by using a first layer, calculating a secondsymmetry center coordinate on a basis of reflected light from third and fourth overlay

measurement marks by using a second layer, and calculating an overlay displacementamount in a predetermined direction between the first layer and the second layer on abasis of the first and second symmetry center coordinates, in which the first to fourthoverlay measurement marks have a plurality of space widths or pattern widths in thepredetermined direction.

申请人：Yosuke OKAMOTO,Taketo KURIYAMA

地址：Mie JP,Mie JP

国籍：JP,JP

更多信息请下载全文后查看