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OVERLAY MEASURING METHOD

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专利名称:OVERLAY MEASURING METHOD发明人:Yosuke OKAMOTO,Taketo KURIYAMA申请号:US13566248申请日:20120803

公开号:US20130148120A1公开日:20130613

专利附图:

摘要:According to one embodiment, an overlay measuring method includes

calculating a first symmetry center coordinate on a basis of reflected light from first andsecond overlay measurement marks formed by using a first layer, calculating a secondsymmetry center coordinate on a basis of reflected light from third and fourth overlay

measurement marks by using a second layer, and calculating an overlay displacementamount in a predetermined direction between the first layer and the second layer on abasis of the first and second symmetry center coordinates, in which the first to fourthoverlay measurement marks have a plurality of space widths or pattern widths in thepredetermined direction.

申请人:Yosuke OKAMOTO,Taketo KURIYAMA

地址:Mie JP,Mie JP

国籍:JP,JP

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