专利名称:OVERLAY MEASURING METHOD发明人:Yosuke OKAMOTO,Taketo KURIYAMA申请号:US13566248申请日:20120803
公开号:US20130148120A1公开日:20130613
专利附图:
摘要:According to one embodiment, an overlay measuring method includes
calculating a first symmetry center coordinate on a basis of reflected light from first andsecond overlay measurement marks formed by using a first layer, calculating a secondsymmetry center coordinate on a basis of reflected light from third and fourth overlay
measurement marks by using a second layer, and calculating an overlay displacementamount in a predetermined direction between the first layer and the second layer on abasis of the first and second symmetry center coordinates, in which the first to fourthoverlay measurement marks have a plurality of space widths or pattern widths in thepredetermined direction.
申请人:Yosuke OKAMOTO,Taketo KURIYAMA
地址:Mie JP,Mie JP
国籍:JP,JP
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