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SELF-ALIGNED INTERCONNECT WITH PROTECTION LAYER

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专利内容由知识产权出版社提供

专利名称：SELF-ALIGNED INTERCONNECT WITH

PROTECTION LAYER

发明人：Yu-Chan Yen,Ching-Feng Fu,Chia-Ying Lee申请号：US14302616申请日：20140612

公开号：US201503371A1公开日：20151217

专利附图：

摘要：An integrated circuit structure includes a first Inter-Layer Dielectric (ILD), a gatestack in the first ILD, a second ILD over the first ILD, a contact plug in the second ILD, anda dielectric protection layer on opposite sides of, and in contact with, the contact plug.

The contact plug and the dielectric protection layer are in the second ILD. A dielectriccapping layer is over and in contact with the contact plug.

申请人：Taiwan Semiconductor Manufacturing Company, Ltd.

地址：Hsin-Chu TW

国籍：TW

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