Illumination optical system, exposure apparatus, a

专利名称：Illumination optical system, exposure

apparatus, and exposure method

发明人：Osamu Tanitsu,Hirohisa Tanaka,Kenichi

Muramatsu,Norio Komine,Hisashi

Nishinaga,Tomoyuki Matsuyama,TakehitoKudo

申请号：US12801043申请日：20100518

公开号：US201002255A1公开日：20100909

专利附图：

摘要：An illumination optical system and method illuminates an irradiated surfacebased on linearly polarized light supplied from a light source. The illumination opticalsystem includes a depolarizer which is selectively positioned between a first position in anoptical path of the illumination optical system and a second position outside of theoptical path, and has a crystal member whose thickness in a direction along an optical axisof the illumination optical system varies in a direction crossing the optical axis.

申请人：Osamu Tanitsu,Hirohisa Tanaka,Kenichi Muramatsu,Norio Komine,HisashiNishinaga,Tomoyuki Matsuyama,Takehito Kudo

地址：Kumagaya-shi JP,Kumagaya-shi JP,Sagamihara-shi JP,Sagamihara-shi JP,TokimaJP,Korihashi-machi JP,Kumagaya-shi JP

国籍：JP,JP,JP,JP,JP,JP,JP

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