A method for determining depressionprotrusion of

专利名称：A method for determining

depression/protrusion of sample andcharged particle beam apparatus therefor

发明人：Takane, Atsushi, Hitachi, Ltd., Intell. Prop.

Gr.,Yamaguchi, Satoru, Hitachi, Ltd, Intell.Prop. Gr.,Komuro, Osamu, Hitachi, Ltd., Intell.Prop. Group,Ozawa, Yasuhiko, Hitachi, Ltd.,Intell. Prop. Gr.,Todokoro, Hideo, Hitachi,Ltd., Intell. Prop. Gr.

申请号：EP02015725.1申请日：20020712公开号：EP1276134A2公开日：20030115

专利附图：

摘要：A method for determining a depression/protrusion, especially of a line andspace pattern formed on a sample, and an apparatus therefor. A charged particle beam isscanned with its direction being inclined to the original optical axis of the charged particlebeam or a sample stage is inclined, broadening of a detected signal in a line scanningdirection of the charged particle beam is measured, the broadening is compared withthat when the charged particle beam is scanned with its direction being parallel to theoriginal optical axis of the charged particle beam, and a depression/protrusion of thescanned portion is determined on the basis of increase/decrease of the broadening.

申请人：Hitachi, Ltd.

地址：6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101-8010 JP

国籍：JP

代理机构：Strehl Schübel-Hopf & Partner

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