A.C. plasma processing system

专利名称：A.C. plasma processing system发明人：Barry W. Manley,Keith H. Billings申请号：US08/667387申请日：19960621公开号：US05882492A公开日：19990316

摘要：An AC plasma processing system according to the present invention mayinclude a transformer for placing an alternating current on a first electrode and a secondelectrode contained within a process chamber. The secondary winding of the transformeris connected across the first and second electrodes. The primary winding of thetransformer is connected to an external power supply. A switching device connected tothe primary winding of the transformer periodically short circuits the primary winding toinduce a secondary voltage in the secondary winding that is less than the arcing voltageassociated with the process chamber.

申请人：SIERRA APPLIED SCIENCES, INC.

代理机构：Klaas, Law, O'Meara & Malkin, P

代理人：Bruce E. Dahl, Esq.

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