Charged particle beam writing method and apparatus

专利名称：Charged particle beam writing method and

apparatus

发明人：Takayuki Abe,Jun Yashima申请号：US11563109申请日：20061124公开号：US07601968B2公开日：20091013

专利附图：

摘要：A charged particle beam writing method includes irradiating a shot of a chargedparticle beam, and deflecting the charged particle beam of the shot using a plurality ofdeflectors arranged on an optical path of the charged particle beam to write a pattern

on a target object, wherein any one of the plurality of deflectors controls deflection of acharged particle beam of a shot different from a shot which is controlled in deflection byanother deflector in the same period.

申请人：Takayuki Abe,Jun Yashima

地址：Kanagawa JP,Kanagawa JP

国籍：JP,JP

代理机构：Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.

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