您好,欢迎来到意榕旅游网。
搜索
您的当前位置:首页Apparatus for measuring wavefront aberrations

Apparatus for measuring wavefront aberrations

来源:意榕旅游网
专利内容由知识产权出版社提供

专利名称:Apparatus for measuring wavefront

aberrations

发明人:Davis, Brett A.,Collins, Michael J.,Iskander,

Daoud R.,Roffman, Jeffrey H.,Ross III,Denwood F.

申请号:EP06076671.4申请日:20010921公开号:EP1745738A3公开日:20070829

专利附图:

摘要:An apparatus and method for measuring wavefront aberrations. The apparatus

comprises a reflecting device (128) for reflecting selected portions of the wavefront(126), an imaging device (132) for capturing information related to the selected portions,and a processor (136) for calculating aberrations of the wavefront from the capturedinformation. The method comprises reflecting selected portions of a wavefront (126)onto the imaging device (132), capturing information related to the selected portions,and processing the captured information to derive the aberrations.

申请人:Johnson and Johnson Vision Care, Inc.

地址:7500 Centurion Parkway, Suite 100 Jacksonville, FL 32256 US

国籍:US

代理机构:Fisher, Adrian John

更多信息请下载全文后查看

因篇幅问题不能全部显示,请点此查看更多更全内容

Copyright © 2019- yrrf.cn 版权所有 赣ICP备2024042794号-2

违法及侵权请联系:TEL:199 1889 7713 E-MAIL:2724546146@qq.com

本站由北京市万商天勤律师事务所王兴未律师提供法律服务