MARK DETECTION METHOD AND MARK POSITION SENSOR

专利名称：MARK DETECTION METHOD AND MARK

POSITION SENSOR

发明人：SHIRAISHI, Naomasa, Nikon Co. Int. Prop.

Headqua.

申请号：EP98954761.7申请日：19981119公开号：EP1041608A1公开日：20001004

专利附图：

摘要：A position detection method detects the position of a mark formed at thebottom of a film such as a polysilicon layer which transmits no visible light. A flattened

alignment mark (26) is formed on a wafer (4), onto which the pattern on a reticle (R) istransferred. A polysilicon film (27) is formed on the alignment mark (26). An alignmentsensor (3) includes a laser light source (10) and a frequency shifter (12), which producelight beams (LA and LB) having wavelengths between 800 and 1500 nm and differingslightly in frequency from each other. The beams (LA and LB) are radiated through aprojection optical system (PL) and transmitted by the polysilicon film (27) to irradiate thealignment mark (26). The diffracted light (LD) from the alignment mark (26) is receivedthrough the optical system (PL) by a photoelectric detector (16). On the basis of thesignal detected by the photoelectric detector (16), the position of the alignment mark(26) is detected.

申请人：Nikon Corporation

地址：Fuji Building, 2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo 100-8831 JP

国籍：JP

代理机构：Wiebusch, Manfred

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