Method and system for defect detection

专利名称：Method and system for defect detection发明人：Yonghang Fu,Yongqiang Liu,Michael J.

Darwin

申请号：US11201279申请日：20050810公开号：US07539583B2公开日：20090526

专利附图：

摘要：A method for inspecting objects such as semiconductor wafers. A stagingplatform and an optical platform are arranged so that the object may be staged and itssurface scanned by optical equipment situated on the optical platform. During the

scanning process, the surface is illuminated with light of a plurality of wavelengths, eachstrobed at a predetermined rate so that multiple images may be collected using timeand frequency multiplexing. The multiple images are stored in a database for analysis,which includes processing selected ones of the multiple images according to one or morealgorithms. The defect-detection algorithms used for each object are determined byreferenced to a predetermined or calculated defect detection protocol, then a defectmask is created for each pixel in the images that is suspected to be defective. The defectmask is then compared to threshold parameters to determine which if any of thesuspected defects should be reported.

申请人：Yonghang Fu,Yongqiang Liu,Michael J. Darwin

地址：Plano TX US,Plano TX US,Beaverton OR US

国籍：US,US,US

代理机构：Dicke, Billig & Czaja, PLLC

更多信息请下载全文后查看