专利名称：Positive photoresists containing crosslinked
polymers
发明人：Timothy G. Adams,Martha M.
Rajaratnam,Ashish A. Pandya,Roger F.Sinta,Pushkara R. Varanasi,KathleenCornett,Ahmad D. Katnani
申请号：US09780989申请日：20010209
公开号：US20020012869A1公开日：20020131
摘要：The invention provides novel cross-linked polymers and positive chemically-amplified photoresist compositions that comprise a photoactive component and suchcrosslinked polymers. Resists of the invention can exhibit enhanced lithographic resultsrelative to comparable compositions where the polymers are not crosslinked.
申请人：SHIPLEY COMPANY, L.L.C.
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容