专利名称:Shadow frame support发明人:大橋 賢吾,橋本 孝男,阿部 忍申请号:JP2015537706申请日:20130916公开号:JP2016500920A公开日:20160114
专利附图:
摘要:The present invention generally provides a processing chamber having ashadow frame support that directs cleaning gas streams to the corners of the chamber.Shadow frame support is disposed along the portion of the chamber wall, i.e., leaving thecorners vacant. During cleaning, the shadow frame is positioned to be placed on bothsubstrate support and shadow frame support. Therefore, the cleaning gas flowing alongthe chamber wall is blocked by shadow frame support, and the cleaning frame is forced
to the corner because the shadow frame support does not extend to the corner.
申请人:APPLIED MATERIALS,INCORPORATED
地址:アメリカ合衆国 カリフォルニア州 95054 サンタ クララ バウアーズ アベニュー 3050
国籍:US
代理人:安齋 嘉章
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