Substrate coated with transparent conductive film

专利名称：Substrate coated with transparent

conductive film and manufacturing methodthereof

发明人：Morio Ogura,Tatsuro Usuki申请号：US10234198申请日：20020905公开号：US06703130B2公开日：20040309

专利附图：

摘要：A substrate coated with a transparent conductive film is manufactured by:disposing a substrate and a target constituted of alloy of In and Sn in a film deposition

chamber leading an Ar gas ion beam into the film deposition chamber to cause collisionof the ion beam with the target sputtering-emission of constitutive atoms of the targetand supply of the emitted atoms to the substrate and leading oxide gas including oxygenradicals as a main element thereof from an ECR radical source into the film depositionchamber to deposit an ITO film on the substrate In this manufacturing method, a film isdeposited on a film or substrate including an organic material without damaging theorganic material. The deposited film has low resistivity, high transmission and preferableflatness.

申请人：SANYO ELECTRIC CO., LTD.

代理机构：Westerman, Hattori, Daniels & Adrian, LLP

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