专利名称:Visible light curing systems, methods for
reducing health risks to individuals exposedto systems designed to cure curablecompositions by exposure to radiation,methods for bonding substrates and visiblelight curing compositions
发明人:Mark M. Konarski,Edwin R. Perez,Eerik
Maandi,Vic Kadziela,Steven J.Hemsen,Ronald E. Belek
申请号:US11305005申请日:20051219公开号:US07915319B2公开日:20110329
摘要:The present invention provides visible light curing systems, methods forreducing health risks to individuals exposed to radiation curing systems, methods forbonding substrates and visible light curing compositions.
申请人:Mark M. Konarski,Edwin R. Perez,Eerik Maandi,Vic Kadziela,Steven J.Hemsen,Ronald E. Belek
地址:Old Saybrook CT US,Newington CT US,Rocky Hill CT US,Rocky Hill CTUS,Southington CT US,Coventry CT US
国籍:US,US,US,US,US,US
代理人:Steven C. Bauman
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