专利名称：Method and apparatus for measurement of
particle size distribution in substantiallyopaque slurries
发明人：Todd A. Cerni,Scott Waisanen申请号：US09069682申请日：19980429公开号：US06246474B1公开日：20010612
专利附图：
摘要：A very sensitive particle distribution probe uses special processing including amodified Twomey/Chahine iterative convergence technique and a specially constructed
sample cell to obtain particle size distribution measurements from optically denseslurries, such as the slurries used in the semiconductor industry for chemical mechanicalplanarization. Spectral transmission data is taken over the spectral range of 0.20-2.5microns, utilizing specially constructed, chemically resistant sample cells of 50-250microns thickness, and miniature, fixed grating, linear detector array spectrometers. Atwavelengths greater than 1 micron, the preferred design utilizes InGaAs linear detectorarrays. An ultrasonic disrupter can be employed to breakup harmless soft agglomerates.In addition to direct particle size distribution measurement, the invention described herecould be used to detect other fundamental causes of slurry degradation, such as foamingand jelling. The probe accomplishes continuous, real time sampling of undiluted slurry. Athree-position chopper allows automated operation in an industrial environment withoutthe need for frequent reference spectra, which would require taking the probe off-line.
申请人：PARTICLE MEASURING SYSTEMS, INC.
代理机构：Duft, Graziano & Forest, P.C.
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