专利名称:PLATING METHOD AND METHOD OF
FORMING MAGNETIC POLE
发明人:Yasunori Kouchi,Masaya Kato申请号:US12246252申请日:20081006
公开号:US20090246715A1公开日:20091001
专利附图:
摘要:The plating method is capable of firmly adhering a resist pattern on a platingbase in case that, for example, a main magnetic pole of a vertical recording magnetichead is formed by using the resist pattern and accurately configurating a sectional shape
of a plated pattern. The plating method comprises the steps of: applying an alkoxylsilylpropyl amino triazine dithiol solution, which is formed by dissolving alkoxylsilyl propylamino triazine dithiol acting as molecular glue in a solvent, onto the plating base;volatilizing the solvent to form a molecular glue layer; applying resist onto the platingbase coated with the molecular glue layer; optically exposing and developing the resistto expose a part of the plating base; and plating the exposed part of the plating basecoated with the molecular glue layer.
申请人:Yasunori Kouchi,Masaya Kato
地址:Kawasaki JP,Kawasaki JP
国籍:JP,JP
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