专利名称：Methods and systems for controlling a
semiconductor fabrication process
发明人：Patrick D. Pannese,Vinaya Kavathekar,Peter
van der Meulen
申请号：US11877096申请日：20071023公开号：US08639489B2公开日：20140128
专利附图：
摘要：Software for controlling processes in a heterogeneous semiconductormanufacturing environment may include a wafer-centric database, a real-time scheduler
using a neural network, and a graphical user interface displaying simulated operation ofthe system. These features may be employed alone or in combination to offer improvedusability and computational efficiency for real time control and monitoring of a
semiconductor manufacturing process. More generally, these techniques may be usefullyemployed in a variety of real time control systems, particularly systems requiringcomplex scheduling decisions or heterogeneous systems constructed of hardware fromnumerous independent vendors.
申请人：Patrick D. Pannese,Vinaya Kavathekar,Peter van der Meulen
地址：Lynnfield MA US,Cupertino CA US,Newburyport MA US
国籍：US,US,US
代理机构：Perman & Green, LLP
代理人：Colin C. Durham
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